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美國Molecular Imprints, Inc. (MII)?
Molecular Imprints公司是一家壓印工具的開發商和制造商。

World’s Market and Technology Leader for High-resolution, Low Cost-of-Ownership sub-30nm Nanoimprint Lithography Systems
Molecular Imprints, Inc. (MII) was founded in Austin, Texas in 2001, spun out of the University of Texas. Molecular Imprints has applied for over 700 patents, resulting in a growing portfolio of over 100 patents issued covering imprint tools, imprint materials and masks/templates, process technology and imprint-specific device designs. Jet and Flash? Imprint Lithography (J-FIL?), powered by our IntelliJet? Drop Pattern Generator Drop Pattern Generation System, is the heart of Molecular Imprints’ advanced nanopatterning technology, allowing precise placement of photoresist on substrates in picoliter quantities, enabling uniform and consistent nanopatterning of features down to 10nm and below at very low cost. Molecular Imprints delivers this value to customers through integration of a unique set of core competencies and partnerships that cover lithography, precision nanomechanics, fluid dynamics, surface chemistry and materials formulation.

This unique nanopatterning capability is leading to manufacturing adoptions in two significant applications: patterned media in hard disk drives (HDD) and semiconductor non-volatile memories. The HDD industry is now standardizing on J-FIL technology to produce the patterned media necessary to take the industry to the 1TB/in2 threshold and beyond. This is necessary because magnetic domains on disk media are so small that ambient heat and proximity effects can cause the bits to become unstable and flip states. Magnetic isolation of the individual bits will soon become necessary to allow for more stable storage that still responds well to normal write fields. DTR will define individual magnetic tracks while BPM will define both the length and width of each magnetic bit.

J-FIL can also economically extend the semiconductor industry’s Moore’s Law to the sub-30nm regime and beyond. A drop-in replacement technology, Molecular Imprints’ systems are being evaluated for mix-and-match strategies with 193nm lithography where J-FIL’s resolution and cost advantages will be focused on critical layers, particularly in leading edge NVM devices.

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