英***Nanobean NB5 電子束光刻機
具有良好的穩定性，平均正常運行時間超過93%
規格:
束流電壓范圍為: 20kV - 100kV
光刻膠的特征尺寸: <8nm (光刻精度)
500um區域拼接/疊加誤差: 小于25nm
自動裝載5卡盤氣鎖系統
NB5發展目標:
改進設計和組件以減少日常服務需求。
實現每年少于5%的機器故障停機時間。
提高性能
便于批量生產。
NB5系統將為進***步發展高偏轉速度和進***步集成電子提供平臺。
The nB4 is a generation ahead of the current competition ａnd with its field-proven performance has gained acceptance in the market place. It has excellent stability ａnd has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB5 which has been developed to further reduce delivery times ａnd service costs.
NB5 development aims:
Refine design ａnd components to reduce routine service requirements.
Achieve a machine-fault-downtime of less than 5% annually.
Enhance performance
Facilitate volume production.
Specification:
Beam Voltage range 20kV - 100kV
Feature size on resist <8nm
Stitching/overlay error <25nm for 500um field
Automatic loading 5 chuck airlock system
The nB5 system will provide a platform for further development to high deflection speed ａnd further integrated electronics.
滬公網安備31011502016460號
